- Industry: Semiconductor, Flat Panel Display, Data Storage, LED
- Process: Wet Etch and Clean, Substrate – Ni-P Plating, Magnetic Head – Wet Etch and Clean, Bulk Chemical Delivery, Chemical
- Chemistry: Aggressive Acids, Aggressive Bases
- Installation Point: Point of Tool
Membrane: PTFE / Support PFA / Oring Encapsulated FKM
0.05, 0.1, 0.2, 0.5, 1, 5, 10 µm
4″ 0.23 m2
10″ 0.8 m2
20″ 1,6 m2
30″ 2,4 m2
Maximum operating conditions
Maximum forward differential pressure 0.51 MPa (5.1 bar, 74 psi) @ 25°C (77°F)
Maximum reverse differential pressure 0.35 MPa (3.5 bar, 50 psi) @ 25°C (77°F)
Maximum operating temperature 120°C (248°F) at the above conditions
Prewet filters are enclosed in bag filled with DI water and 1% H202. Drain and flush with 20 liters of DI water (per 10”) after installing filter.
Savana® AT can be sterilized by autoclaving up to 50 cycles at 125°C or sterilized by steam-in-place up to 50 cycles at 135°C for 30 minutes at less than 0.3 bar differential pressure.