- Industry: Semiconductor, Flat Panel Display, Data Storage, LED
- Process: Wet Etch and Clean, Substrate – Ni-P Plating, Magnetic Head – Wet Etch and Clean, Bulk Chemical Delivery, Chemical
- Chemistry: Aggressive Acids, Aggressive Bases
- Installation Point: Point of Tool
Materials
Membrane: PTFE / Support PFA / Oring Encapsulated FKM
Retention Ratings
0.05, 0.1, 0.2, 0.5, 1, 5, 10 µm
Shelf life
1 year
Membrane Area
4″ 0.23 m2
10″ 0.8 m2
20″ 1,6 m2
30″ 2,4 m2
Maximum operating conditions
Maximum forward differential pressure 0.51 MPa (5.1 bar, 74 psi) @ 25°C (77°F)
Maximum reverse differential pressure 0.35 MPa (3.5 bar, 50 psi) @ 25°C (77°F)
Maximum operating temperature 120°C (248°F) at the above conditions
Prewet filters are enclosed in bag filled with DI water and 1% H202. Drain and flush with 20 liters of DI water (per 10”) after installing filter.
Savana® AT can be sterilized by autoclaving up to 50 cycles at 125°C or sterilized by steam-in-place up to 50 cycles at 135°C for 30 minutes at less than 0.3 bar differential pressure.